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LFC150 G Plasma Cleaning System - Applications

A low-pressure plasma process is applied to optimize plasma penetration.The plasma chemical cleaning process takes advantage of low-energy ions and radicals that react with surface contaminants to form volatile compounds.

Image: LFC150 G gas supply recipes - Click to enlarge Versatile process development due to three independent process gas supplies (Ar, H2, and N2). Each recipe may consist of up to 5 distinct process steps.


Image: LFC150 G touch screen panel - Click to enlarge User-friendly touch screen panel (8.4 inch). Easy-to-use system software, stores up to 20 process recipes.


Image: Hydrogen generator - Click to enlarge Hydrogen generator for safe and reliable process gas supply (TÜV certified).