Nanomechanical Cantilever Array Sensors

H.P. Lang
Uni Basel, Institute of Physics

Ch. Gerber
IBM, Zurich Research Laboratory

G. Nicolussi
Inficon AG, Balzers, Liechtenstein

Abstract

We have developed and tested a cantilever-array-based monitoring tool for in situ operation in a plasma cleaner. Provided the cantilever array was exposed to the same level of contamination as the chip carriers to be plasma-cleaned, the device is capable of detecting the removal rate and the end point of the cleaning process. The progress of the plasma-cleaning process is tracked instantly by observation of the resonance frequency shift of oscillating microfabricated cantilevers.

• Published in TOP NANO 21, Third Annual Report, October 2002
• For further information please contact UCP at ucpgroup@ucp.li

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